The global Extreme Ultraviolet Lithography (EUVL) market size was USD 3.12 Billion in 2021 and is expected to register a revenue CAGR of 27.07% during the forecast period, according to the latest analysis by Emergen Research. The rising demand for Laser Produced Plasma (LPP) for light sourcing is projected to support market revenue growth between 2021 and 2030. To accelerate particles and produce brief x-ray bursts, laser-produced plasmas are used. In addition, they help simulate astronomical plasmas in laboratories. Molten tin droplets around 25 microns in diameter are blasted from a generator at 70 meters per second in an LPP source. The droplets are initially hit by a weak laser pulse as they descend, which gives them a pancake shape. The flattened droplet is then vaporized by a stronger laser pulse, forming a plasma that releases EUV light. This procedure is carried out 50,000 times per second in order to generate enough light to create microchips. LPP has high output power and Conversion Efficiency (CE), which makes them a promising alternative for EUVL sources. For example, the NXE:3400B EUV scanner setting CO2 LPP system from ASML is now deployed and in use by chipmaker customers.
The competitive landscape of the report has been formulated by considering all the vital parameters such as company profiling, market share, recent developments and advancements, gross margins, product portfolio, revenue generation, financial standing, market position, and expansion plans. The report also discusses in detail the recent mergers and acquisitions, joint ventures, collaborations, product launches and brand promotions, agreements, corporate and government deals, and partnerships, among others. The report also sheds light on the recent technological developments and product advancements in the Extreme Ultraviolet Lithography market.
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The leading market contenders listed in the report are:
ASML, Tokyo Electron Limited, Samsung, Taiwan Semiconductor Manufacturing Company, Intel Corporation, NTT Advanced Technology Corporation, Nikon Corporation, Toshiba Corporation, Toppan Inc., Canon Inc., and ZEISS International
The research study examines historic data from 2018 and 2020 to draw forecasts until 2030. The timeline makes the report an invaluable resource for readers, investors, and stakeholders looking for key insights in readily accessible documents with the information presented in the form of tables, charts, and graphs.
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Market Overview:
The report bifurcates the Extreme Ultraviolet Lithography market on the basis of different product types, applications, end-user industries, and key regions of the world where the market has already established its presence. The report accurately offers insights into the supply-demand ratio and production and consumption volume of each segment.
Segments Covered in this report are:
Equipment Outlook (Revenue, USD Billion; 2019–2030)
- Light Source
- Mask
- Mirrors
- Others
End-Use Outlook (Revenue, USD Billion; 2019–2030)
- Integrated Device Manufacturers (IDMs)
- Foundry
- Others
Regional Outlook (Revenue, USD Billion; 2019–2030)
- North America
- U.S.
- Canada
- Mexico
- Europe
- Germany
- France
- U.K.
- Italy
- Spain
- Benelux
- Rest of Europe
- Asia Pacific
- China
- India
- Japan
- South Korea
- Rest of APAC
- Latin America
- Brazil
- Rest of LATAM
- Middle East & Africa
- Saudi Arabia
- UAE
- South Africa
- Turkey
- Rest of Middle East & Africa
- North America
The research report offers a comprehensive regional analysis of the market with regards to production and consumption patterns, import/export, market size and share in terms of volume and value, supply and demand dynamics, and presence of prominent players in each market.
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Regional Analysis Covers:
North America (U.S., Canada)
Europe (U.K., Italy, Germany, France, Rest of EU)
Asia Pacific (India, Japan, China, South Korea, Australia, Rest of APAC)
Latin America (Chile, Brazil, Argentina, Rest of Latin America)
Middle East & Africa (Saudi Arabia, U.A.E., South Africa, Rest of MEA)
Key reasons to buy the Global Extreme Ultraviolet Lithography Market report:
- The latest report comprehensively studies the global Extreme Ultraviolet Lithography market size and provides useful inference on numerous aspects of the market, such as the current business trends, market share, product offerings, and product share.
- The report offers an insightful analysis of the regional outlook of the market.
- It offers a detailed account of the end-use applications of the products & services offered by this industry.
- The report holistically covers the latest developments taking place in this industry. Therefore, it lists the most effective business strategies implemented by the market rivals for ideal business expansion.
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